X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge
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Date
2001-12Author
Sun, XH
Tang, YH
Zhang, P.
Naftel, SJ
Sammynaiken, R.
Sham, TK
Peng, HY
Zhang, YF
Wong, NB
Lee, ST
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Citation
Reproduced from Sun, XH, YH Tang, P. Zhang, SJ Naftel, et al. 2001. "X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge." Journal of Applied Physics 90(12): 6379-6383, with the permission of AIP Publishing.