X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge

Sun, XHTang, YHZhang, P.Naftel, SJSammynaiken, R.Sham, TKPeng, HYZhang, YFWong, NBLee, ST2013-08-122013-08-122001-12Reproduced from Sun, XH, YH Tang, P. Zhang, SJ Naftel, et al. 2001. "X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edge." Journal of Applied Physics 90(12): 6379-6383, with the permission of AIP Publishing.0021-8979http://dx.doi.org/10.1063/1.1417997http://hdl.handle.net/10222/30977No abstract available.X-ray absorption fine structure and electron energy loss spectroscopy study of silicon nanowires at the Si L-3,L-2 edgearticle90126379